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1

In Situ Formation of Ti-TiAl₃ Metallic-Intermetallic Composite by Electric Current Activated Sintering Method

100%

Yener T., Okumus S., Zeytin S.

Acta Physica Polonica A

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2015

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vol. 127

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issue 4

917-920

EN

In this study we have investigated fabrication of in situ metallic- intermetallic Ti-TiAl₃ composites from powder mixture containing 40 wt % Ti-Al, 50 wt % Ti-Al and 60 wt % Ti-Al by electric current activated sintering method. Powder mixtures without additive were compressed uniaxially under 130 MPa of pressure and sintered 2000 A current for 20 minutes in a steel mould. Microstructures of sintered samples were investigated by optic and scanning electron microscopes, phases in samples were analyzed by XRD and their hardness was measured by Vickers hardness tester. Optic and scanning electron microscopes investigations showed that microstructures of samples were consisting of two components: Main component was titanium aluminide and other was metallic titanium. Besides this there was a trace amount of aluminium oxide in the sintered body. XRD analyses also demonstrated that main phase is TiAl₃. It was determined that as weight percentage of titanium in the mixture was decreasing, also the amount of metallic titanium has decreased in the sintered body. Additionally, average hardness values of samples were about 500 HV

2

Effects of RF Power on Electrical and Structural Properties of Sputtered SnO_2:Sb Thin Films

76%

Cevher O., Guler M., Tocoglu U., Cetinkaya T., Akbulut H., Okumus S.

Acta Physica Polonica A

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2014

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vol. 125

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issue 2

293-295

EN

In this work, antimony doped tin oxide (SnO_2:Sb) thin films were fabricated using a radio frequency magnetron sputtering system on Si wafer and glass substrates. The base pressure in the sputtering chamber was 1.0 Pa. The SnO_2:Sb thin films were deposited for 1.0 h in a mixture of Ar and O_2 environment with O_2/Ar ratio of 10/90 at 75, 100, and 125 W RF sputtering powers. The microstructure of SnO_2:Sb thin films was assessed using a field emission scanning electron microscopy. The crystallographic structure of the sample was determined by X-ray diffraction. The average surface roughness (R_{a}) was measured with atomic force microscopy. The electrical resistivity of the deposited films was measured by the four-point-probe method. The thicknesses of the films were measured by surface profiler.

3

Thin Film Nanostructured ATO and ATO Based Composite Anodes for Li-Ion Batteries

76%

Cevher O., Guler M., Tocoglu U., Cetinkaya T., Akbulut H., Okumus S.

Acta Physica Polonica A

|

2014

|

vol. 125

|

issue 2

296-298

EN

In this study, antimony doped tin oxide films were deposited on multiwall carbon nanotube buckypaper and Cr coated stainless steel substrates using a radio frequency magnetron sputtering process in a mixed oxygen/argon (5/95) gas environment. The depositions of antimony doped tin oxide on the multiwall carbon nanotube buckypaper and stainless steel substrates were carried out using the parameters organized as: target composition antimony doped tin oxide (SnO_2:Sb = 90:10 wt%); total system pressure 1 Pa; sputtering power (RF) 100 W. The surface morphology of the antimony doped tin oxide films was investigated by field emission scanning electron microscopy. The crystallographic structure of the samples was determined by X-ray diffraction. The electrochemical properties of antimony doped tin oxide and antimony doped tin oxide-multiwall carbon nanotube nanocomposite anodes containing CR2016 cells were measured by galvanostatic charge-discharge experiments.

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3 Acta Physica Polonica A

1 2015

2 2014

3 Okumus S.

2 Akbulut H.

2 Cetinkaya T.

2 Cevher O.

2 Guler M.

2 Tocoglu U.

1 Yener T.

1 Zeytin S.

In Situ Formation of Ti-TiAl₃ Metallic-Intermetallic Composite by Electric Current Activated Sintering Method

Effects of RF Power on Electrical and Structural Properties of Sputtered SnO_2:Sb Thin Films

Thin Film Nanostructured ATO and ATO Based Composite Anodes for Li-Ion Batteries