PL EN


Preferences help
enabled [disable] Abstract
Number of results
1996 | 89 | 3 | 401-404
Article title

Observation of Nickel Hydroxide Layer on Ni Electrode by in situ Atomic Force Microscopy

Content
Title variants
Languages of publication
EN
Abstracts
EN
The layer of nickel hydroxide was formed on the surface of polycrystalline Ni immersed in 1 M KOH by cycling the potential in the range between -0.1 and 0.6 V vs. Pt in 1 M KOH. The layer thickness of 8.5 nm, estimated by an electrochemical method, corresponded to about 10 monolayers of Ni(OH)_{2}. The changes of thickness of the nickel hydroxide film during the process of its oxidation and reduction were monitored by the use of in situ atomic force microscopy with the tip fixed and the electrode potential scanned between -0.1 and +0.6 V at a scan rate of 100 mV/s. The process of oxidation resulted in the film thickness decrease by about 3 nm. This change could be explained as to be due to the removal of a proton from Ni(OH)_{2} layer.
Keywords
EN
Year
Volume
89
Issue
3
Pages
401-404
Physical description
Dates
published
1996-03
References
Document Type
Publication order reference
YADDA identifier
bwmeta1.element.bwnjournal-article-appv89z318kz
Identifiers
JavaScript is turned off in your web browser. Turn it on to take full advantage of this site, then refresh the page.