Observation of Nickel Hydroxide Layer on Ni Electrode by in situ Atomic Force Microscopy

• Authors: A. Kowal , R. Niewiara , B. Perończyk , J. Haber
• Languages of publication: EN

Abstracts

EN

The layer of nickel hydroxide was formed on the surface of polycrystalline Ni immersed in 1 M KOH by cycling the potential in the range between -0.1 and 0.6 V vs. Pt in 1 M KOH. The layer thickness of 8.5 nm, estimated by an electrochemical method, corresponded to about 10 monolayers of Ni(OH)_{2}. The changes of thickness of the nickel hydroxide film during the process of its oxidation and reduction were monitored by the use of in situ atomic force microscopy with the tip fixed and the electrode potential scanned between -0.1 and +0.6 V at a scan rate of 100 mV/s. The process of oxidation resulted in the film thickness decrease by about 3 nm. This change could be explained as to be due to the removal of a proton from Ni(OH)_{2} layer.

Keywords

EN

68.35.Bs

• Publisher: Institute of Physics, Polish Academy of Sciences
• Journal: Acta Physica Polonica A
• Year: 1996
• Volume: 89
• Issue: 3
• Pages: 401-404

Dates

published

1996-03

Contributors

author

A. Kowal

• Institute of Catalysis and Surface Chemistry, Polish Academy of Sciences, Niezapominajek, 30-239 Kraków, Poland

author

R. Niewiara

• Institute of Catalysis and Surface Chemistry, Polish Academy of Sciences, Niezapominajek, 30-239 Kraków, Poland

author

B. Perończyk

• Institute of Catalysis and Surface Chemistry, Polish Academy of Sciences, Niezapominajek, 30-239 Kraków, Poland

author

J. Haber

• Institute of Catalysis and Surface Chemistry, Polish Academy of Sciences, Niezapominajek, 30-239 Kraków, Poland

Identifiers

DOI

10.12693/APhysPolA.89.401