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2004 | 105 | 1-2 | 107-114
Article title

Electroresistance of La-Ca-MnO Thin Films

Content
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EN
Abstracts
EN
Epitaxial, textured, and polycrystalline La_{0.7}Ca_{0.3}Mn O_3 films, having about 150 nm thickness, were prepared by pulsed laser deposition techniques onto (110) NdGaO_3, MgO and lucalox substrates and investigated using 10 ns duration, 0.5 ns rise time electrical pulses having amplitude up to 500 V. Electroresistance of the films [R(E)-R(0)]/R(0) was investigated up to 80 kV/cm electric field strengths in temperatures ranging from 300 K to 4.2 K. Strong (up to 93%) negative electroresistance was obtained in polycrystalline La_{0.7}Ca_{0.3}MnO_3 films prepared on MgO and lucalox substrates. The epitaxial films grown on NdGaO_3 substrate demonstrated only a small resistance change due to Joule heating induced by a current pulse. It was concluded that electroresistance manifests itself in strongly inhomogeneous manganites films exhibiting a large number of structural imperfections producing ferromagnetic tunnel junction nets.
Keywords
EN
Publisher

Year
Volume
105
Issue
1-2
Pages
107-114
Physical description
Dates
published
2004-01/02
received
2003-09-15
Contributors
author
  • Semiconductor Physics Institute, A. Goštauto 11, Vilnius, Lithuania
author
  • Semiconductor Physics Institute, A. Goštauto 11, Vilnius, Lithuania
  • Semiconductor Physics Institute, A. Goštauto 11, Vilnius, Lithuania
  • Semiconductor Physics Institute, A. Goštauto 11, Vilnius, Lithuania
author
  • Semiconductor Physics Institute, A. Goštauto 11, Vilnius, Lithuania
  • Semiconductor Physics Institute, A. Goštauto 11, Vilnius, Lithuania
  • Semiconductor Physics Institute, A. Goštauto 11, Vilnius, Lithuania
author
  • US Army Space and Missile Defense Command, Huntsville AL, USA
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Document Type
Publication order reference
Identifiers
YADDA identifier
bwmeta1.element.bwnjournal-article-appv105n114kz
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