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2002 | 102 | 2 | 221-225
Article title

Electron Microscopy and X-ray Diffraction Study of AlN Layers

Content
Title variants
Languages of publication
EN
Abstracts
EN
AlN nanocrystalline layers and superstructures are used in the modern optoelectronic technology as reflecting mirrors in semiconductor lasers. In the present work the properties of AlN films prepared by sputtering methods from an AlN target in reactive Ar + N plasma were investigated. The characterisation was performed with HRTEM, SEM, glancing angle XRD and RBS methods. The present measurements confirmed the polycrystalline structure of AlN layers and enabled the evaluation of their grain size. The roughness and thickness of the layers were additionally determined by ellipsometric and profilometric measurements.
Keywords
EN
Year
Volume
102
Issue
2
Pages
221-225
Physical description
Dates
published
2002-08
received
2001-09-23
References
  • 1. H. Takikawa, K. Kimura, R. Miyana, T. Sakakibara, A. Bendavid, P.J. Martin, A. Matsumuro, K. Tsutsumi, Thin Solid Films, 386, 276, 2001
  • 2. S. Karmann, H.P.D. Schenk, U. Kaiser, A. Fissel, Wo. Richter, Mater. Sci. Eng. B, 50, 228, 1997
  • 3. Xiao-Hong Xu, Hai-Shun Wu, Cong-Jie Zhang, Zhi-Hao Jin, Thin Solid Films, 388, 62, 2001
  • 4. X.D. Wang, U. Mazur, J.T. Dickson, Thin Solids Film, 240, 45, 1994
  • 5. A. Jagoda, L. Dobrzański, M. Możdżonek, in: VII Konferencja Naukowa 'Technologia Elektronowa', ELTE 2000, Polanica Zdrój (Poland) 2000, p. 234 (in Polish)
  • 6. A. Jagoda, L. Dobrzański, K. Dąbrowska, K. Przyborowska, in: VII Konferencja Naukowa 'Technologia Elektronowa', ELTE 2000, Polanica Zdrój (Poland) 2000, p. 717 (in Polish)
  • 7. J.W. Martin, D.D. Cohen, N. Dytlewski, D.B. Garton, H.J. Whitlow, G.J. Russell, Nucl. Instrum. Methods Phys. Res. B, 94, 277, 1994
Document Type
Publication order reference
YADDA identifier
bwmeta1.element.bwnjournal-article-appv102n217kz
Identifiers
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