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Number of results
Journal
2011 | 9 | 6 | 1421-1425
Article title

Characterization of the surface topography and nano-hardness of Cu/Ni multilayer structures

Content
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Languages of publication
EN
Abstracts
EN
This article describes the results of a study of Cu/Ni multilayer coatings applied on a monocrystalline Si(100) silicon substrate by the deposition magnetron sputtering technique. Composed of 100 bilayers each, the multilayers were differentiated by the Ni sublayer thickness (1.2 to 3 nm), while maintaining the constant Cu sublayer thickness (2 nm). The multilayer coatings were characterized by assessing their surface topography using atomic force microscopy and their mechanical properties with nano-hardness measurements by the Berkovich method. The tests showed that the hardness of multilayers was substantially influenced by the thickness ratio of Cu and Ni sublayers and by surface roughness. The highest hardness and, at the same time, the lowest roughness was exhibited by a multilayer structure with a Cu-to-Ni sublayer thickness ratio of 2:1.5.
Publisher

Journal
Year
Volume
9
Issue
6
Pages
1421-1425
Physical description
Dates
published
1 - 12 - 2011
online
15 - 10 - 2011
Contributors
author
  • Institute of Materials Engineering, Czestochowa University of Technology, al. Armii Krajowej 19, 42-200, Czestochowa, Poland, kulej@wip.pcz.pl
  • Institute of Materials Engineering, Czestochowa University of Technology, al. Armii Krajowej 19, 42-200, Czestochowa, Poland
author
  • Department of Metallurgy and Materials Engineering, Katholieke Universiteit Leuven, B-3001, Heverlee, Belgium
  • Institute of Materials Engineering, Czestochowa University of Technology, al. Armii Krajowej 19, 42-200, Czestochowa, Poland
References
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Document Type
Publication order reference
Identifiers
YADDA identifier
bwmeta1.element.-psjd-doi-10_2478_s11534-011-0055-y
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