Point-by-point inscription of 250-nm-period structure in bulk fused silica by tightly-focused femtosecond UV pulses: experiment and numerical modeling

• Authors: David Nikogosyan , Mykhaylo Dubov , Holger Schmitz , Vladimir Mezentsev , Ian Bennion , Padraig Bolger , Anatoly Zayats
• Languages of publication: EN

Abstracts

EN

By conducting point-by-point inscription in a continuously moving slab of a pure fused silica at the optimal depth (170 μm depth below the surface), we have fabricated a 250-nm-period nanostructure with 30 nJ, 300 fs, 1 kHz pulses from frequency-tripled Ti:sapphire laser. This is the smallest value for the inscribed period yet reported, and has been achieved with radical improvement in the quality of the inscribed nanostructures in comparison with previous reports. The performed numerical modeling confirms the obtained experimental results.

Keywords

EN

femtosecond UV laser; microfabrication; fused silica; nanostructure

• Publisher: De Gruyter Open
• Journal: Open Physics
• Year: 2010
• Volume: 8
• Issue: 2
• Pages: 169-177

Dates

published

1 - 4 - 2010

online

30 - 1 - 2010

Contributors

author

David Nikogosyan

author

Mykhaylo Dubov

• Photonics Research Group, Aston University, Birmingham, B4 7ET, UK

author

Holger Schmitz

• Photonics Research Group, Aston University, Birmingham, B4 7ET, UK

author

Vladimir Mezentsev

• Photonics Research Group, Aston University, Birmingham, B4 7ET, UK

author

Ian Bennion

• Photonics Research Group, Aston University, Birmingham, B4 7ET, UK

author

Padraig Bolger

• Centre for Nanostructure Media, IRCEP, The Queen’s University of Belfast, Belfast, BT7 1NN, UK

author

Anatoly Zayats

• Centre for Nanostructure Media, IRCEP, The Queen’s University of Belfast, Belfast, BT7 1NN, UK

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Identifiers

DOI

10.2478/s11534-009-0031-y