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Number of results

Journal

2010 | 8 | 2 | 169-177

Article title

Point-by-point inscription of 250-nm-period structure in bulk fused silica by tightly-focused femtosecond UV pulses: experiment and numerical modeling

Content

Title variants

Languages of publication

EN

Abstracts

EN
By conducting point-by-point inscription in a continuously moving slab of a pure fused silica at the optimal depth (170 μm depth below the surface), we have fabricated a 250-nm-period nanostructure with 30 nJ, 300 fs, 1 kHz pulses from frequency-tripled Ti:sapphire laser. This is the smallest value for the inscribed period yet reported, and has been achieved with radical improvement in the quality of the inscribed nanostructures in comparison with previous reports. The performed numerical modeling confirms the obtained experimental results.

Publisher

Journal

Year

Volume

8

Issue

2

Pages

169-177

Physical description

Dates

published
1 - 4 - 2010
online
30 - 1 - 2010

Contributors

  • Photonics Research Group, Aston University, Birmingham, B4 7ET, UK
  • Photonics Research Group, Aston University, Birmingham, B4 7ET, UK
  • Photonics Research Group, Aston University, Birmingham, B4 7ET, UK
author
  • Photonics Research Group, Aston University, Birmingham, B4 7ET, UK
  • Centre for Nanostructure Media, IRCEP, The Queen’s University of Belfast, Belfast, BT7 1NN, UK
  • Centre for Nanostructure Media, IRCEP, The Queen’s University of Belfast, Belfast, BT7 1NN, UK

References

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Document Type

Publication order reference

Identifiers

YADDA identifier

bwmeta1.element.-psjd-doi-10_2478_s11534-009-0031-y
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