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The surface charge Q_{sc} versus the surface Fermi level position Φ_{s} for real (111) surfaces of p- and n-type Si has been studied. The values of Q_{sc} have been obtained on the basis of measurements of the surface potential V_{s} by means of the surface photo voltage method. The complementary character of Q_{sc}(Φ_{s}) dependences for the surfaces of p- and n-type Si supports the fact that the surface state distribution is not dependent on the type of bulk doping but on the surface preparation process.