Angle Resolved Scattering Combined with Optical Profilometry as Tools in Thin Films and Surface Survey

• Authors: K. Marszałek , N. Wolska , J. Jaglarz
• Languages of publication: EN

Abstracts

EN

The work presents an application of two scanning optical techniques, i.e. optical profilometry and angle resolved scattering method. The first method measures the light reflected from a film during scan of the surface, while the second method measures light intensity as a function of the scattering angle. The angle resolved scattering and optical profilometry measurements, being complementary to the atomic force microscopy, give information about surface topography. Scattered radiation measured by angle resolved scattering and optical profilometry is a function of height and slope of microfacets. The analysis of images allows to determine the most important statistic surface parameters, like roughness, height distribution and autocorrelation length, in large wavelength range by the determination of power spectral density function. The fast Fourier transform of angle resolved scattering and optical profilometry images permits to determine the distribution of surface features in the inverse space, such as periodicity and anisotropy. In this paper the results obtained for porous SiO₂, SiO₂-TiO₂ blends, TiN and polymer thin films have been presented. The paper demonstrates the usefulness of the angle resolved scattering and optical profilometry for the surface and volume thin film inspection.

Keywords

EN

78.35.+c; 78.68.+m; 78.66.Jg

Discipline

• 78.68.+m: Optical properties of surfaces
• 78.66.Jg: Amorphous semiconductors; glasses
• 78.35.+c: Brillouin and Rayleigh scattering; other light scattering(for Raman scattering, see 78.30.-j; for time resolved light scattering spectroscopy, see 78.47.je)

• Publisher: Institute of Physics, Polish Academy of Sciences
• Journal: Acta Physica Polonica A
• Year: 2015
• Volume: 128
• Issue: 1
• Pages: 81-86

Dates

published

2015-7

received

2014-05-12

Contributors

author

K. Marszałek

• AGH University of Science and Technology, al. A. Mickiewicza 30, 30-059 Krakow, Poland

author

N. Wolska

• Institute of Physics, Cracow University of Technology, Podchorążych 1, 30-084 Kraków, Poland
• Elkom Trade S.A., Targowa 21, 27-400 Ostrowiec Świętokrzyski, Poland

author

J. Jaglarz

• Institute of Physics, Cracow University of Technology, Podchorążych 1, 30-084 Kraków, Poland

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Identifiers

DOI

10.12693/APhysPolA.128.81