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2011 | 119 | 2 | 228-230

Article title

Low Temperature Overheating Effect in SiGe p-Type Quantum Wells. Methods of the Hole-Phonon Energy Relaxation Time Determination

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EN

Abstracts

EN
The temperature dependence of the hole-phonon energy relaxation time τ_{hph} (T) under hot-hole conditions was studied in SiGe p-type quantum wells. The hot-hole temperature T_{h} was estimated through three different experimental methods: (i) from a comparison of the amplitude of the Shubnikov-de Haas oscillations changed by current and temperature; (ii) from a comparison of the phase relaxation time in the effect of weak localization obtained either at different temperatures and minimum current or at different current at a fixed temperature; (iii) from a comparison of the temperature and current dependences of the sample resistance. The values of T_{h} obtained by all three different methods were used to calculate, from the heat balance equation, the temperature dependence of the hole-phonon energy relaxation time τ_{hph} (T). All three temperature dependences τ_{hph} (T) were almost identical and demonstrated transition of the 2D system from "partial inelasticity" to small angle scattering at lower temperatures.

Keywords

EN

Contributors

author
  • B.I. Verkin Institute for Low Temperature Physics and Engineering of NAS of Ukraine, 47, Lenin Ave., Kharkov, 310164, Ukraine

References

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  • 7. V.V. Andrievskii, A.Yu. Rozheshchenko, and Yu.F. Komnik, M. Myronov, O.A. Mironov, T.E. Whall, Low Temp. Phys. 29, 318 (2003)
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Document Type

Publication order reference

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YADDA identifier

bwmeta1.element.bwnjournal-article-appv119n242kz
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