Advances in High Intensity e-Beam Diode Development for Flash X-Ray Radiography

• Authors: B. Oliver , K. Hahn , M. Johnston , S. Portillo
• Languages of publication: EN

Abstracts

EN

Recent experiments at Sandia National Laboratories have demonstrated an electron beam diode X-ray source capable of producing >350 rad at one meter with 1.7 mm FWHM X-ray source distribution, with a 50 ns pulse-width and X-ray photon endpoint energy spectrum in the 6-7 MeV range. The diode operates at current densities of ≈1 MA/cm^{2}. The intense electron beam rapidly ( ≈ 5 ns) heats the X-ray conversion anode/target, liberating material in the form of low density ion emission early in the pulse and high density plasma later. This environment gives rise to beam/plasma collective effects which dominate the diode and beam characteristics, affecting the radiation properties (dose and spot-size). A review of the diode operation, the measured source characteristics and the simulation methods and diagnostics used to guide its optimization is given.

Keywords

EN

41.75.Fr; 41.75.Ht; 41.50.+h; 52.59.Mv; 87.59.B-

Discipline

• 41.75.Fr: Electron and positron beams
• 52.59.Mv: High-voltage diodes(for high-current and high-voltage technology, see 84.70.+p)
• 87.59.B-: Radiography
• 41.75.Ht: Relativistic electron and positron beams
• 41.50.+h: X-ray beams and x-ray optics(see also 07.85.Fv X- and γ-ray sources, mirrors, gratings, and detectors in instruments)

• Publisher: Institute of Physics, Polish Academy of Sciences
• Journal: Acta Physica Polonica A
• Year: 2009
• Volume: 115
• Issue: 6
• Pages: 1044-1046

Dates

published

2009-06

Contributors

author

B. Oliver

• Sandia National Laboratories, Albuquerque, New Mexico, USA

author

K. Hahn

• Sandia National Laboratories, Albuquerque, New Mexico, USA

author

M. Johnston

• Sandia National Laboratories, Albuquerque, New Mexico, USA

author

S. Portillo

• Sandia National Laboratories, Albuquerque, New Mexico, USA

References

• 1. I.D. Smith, et al., in: Proc. 12th IEEE Int. Pulsed Power Conf., Monterey (CA, USA) 1999, p. 403
• 2. S.B. Swanekamp, G. Cooperstein, J.W. Schumer et al., IEEE Trans. Plasma Sci. 32, 2004 (2004)
• 3. D.D. Hinshelwood, R.J. Allen, R. Commisso et al., IEEE Trans. Plasma Sci. 35, 565 (2007)
• 4. G. Cooperstein et al., Phys. Plasma 8, 4618 (2001)
• 5. B.V. Oliver, P.F. Ottinger, T.C. Genoni et al., Phys. Plasma 11, 3976 (2004)

Identifiers

DOI

10.12693/APhysPolA.115.1044