X-ray Characterization of Films Formed by Pulsed Laser Deposition on Cold Substrates from YBaCuO Targets

• Authors: J. Pełka , W. Paszkowicz , P. Gierłowski , S. Lewandowski , M. Zieliński , S. Barbanera , M. Knapp
• Languages of publication: EN

Abstracts

EN

Grazing-incidence X-ray diffraction supplemented with atomic force microscopy and secondary ion mass spectroscopy were applied to the characterization of films deposited by laser ablation on cold substrates from YBaCuO targets and subsequently irradiated with additional laser pulses of lower energy density. Evolution of X-ray diffraction pattern was observed as a function of irradiation dose. For the as-deposited films the pattern was typical of the amorphized solids. For the films irradiated with doses higher than the threshold, the pattern was enriched with the diffraction peaks, whose general features, like peak positions, widths and relative intensities were almost independent of the dose. The size of the crystallites was deduced from the peak widths to be not smaller than 12-16 nm. Comparison of the pattern with patterns of known phases indicates that, apart of the amorphous component, a structure with an admixture of some new metastable or high temperature phase(s) is formed during the process of pulsed laser annealing. The atomic force microscopy observations revealed that the surface roughness shows a pronounced minimum at low irradiation doses. The secondary ion mass spectroscopy investigation confirms that the strongest chemical changes (increase in concentration of yttrium and copper) due to irradiation with higher doses are observed in the near-surface film material.

Keywords

EN

52.38.Mf; 81.15.-z; 68.55.-a

Discipline

• 52.38.Mf: Laser ablation(see also 79.20.Ds, Laser-beam impact phenomena)
• 81.15.-z: Methods of deposition of films and coatings; film growth and epitaxy(for structure of thin films, see 68.55.-a; see also 85.40.Sz Deposition technology in microelectronics; for epitaxial dielectric films, see 77.55.Px)
• 68.55.-a: Thin film structure and morphology(for methods of thin film deposition, film growth and epitaxy, see 81.15.-z)

• Publisher: Institute of Physics, Polish Academy of Sciences
• Journal: Acta Physica Polonica A
• Year: 2002
• Volume: 101
• Issue: 5
• Pages: 787-794

Dates

published

2002-05

received

2001-08-31

Contributors

author

J. Pełka

• Institute of Physics, Polish Academy of Sciences, al. Lotników 32/46, 02-668 Warsaw, Poland

author

W. Paszkowicz

• Institute of Physics, Polish Academy of Sciences, al. Lotników 32/46, 02-668 Warsaw, Poland

author

P. Gierłowski

• Institute of Physics, Polish Academy of Sciences, al. Lotników 32/46, 02-668 Warsaw, Poland

author

S. Lewandowski

• Institute of Physics, Polish Academy of Sciences, al. Lotników 32/46, 02-668 Warsaw, Poland

author

M. Zieliński

• Institute of Physics, Polish Academy of Sciences, al. Lotników 32/46, 02-668 Warsaw, Poland

author

S. Barbanera

• Institute of Solid State Electronics CNR, via Cineto Romano 42, 00-156 Rome, Italy

author

M. Knapp

• Department of Materials Science, Darmstadt University of Technology, Petersenstr. 23, 64287 Darmstadt, Germany

References

• 1. S. Proyer, E. Stangl, M. Borz, B. Hellebrand, D. Bauerle, Physica C, 257, 1, 1996
• 2. M.D. Strikovsky, E.B. Klyuenkov, S.V. Gaponov, Appl. Phys. Lett., 63, 1146, 1995
• 3. T.J. Jackson, S.B. Palmer, J. Phys. D, 27, 1581, 1994
• 4. V.D. Okunev, Z.A. Samoilenko, V.M. Svistunov, A. Abal'oshev, E. Dynowska, P. Gierłowski, A. Klimov, S.J. Lewandowski, J. Appl. Phys., 85, 7282, 1999
• 5. D.P. Butler, Z. Celik-Butler, R. Adam, R. Sobolewski, J. Appl. Phys., 85, 1075, 1999
• 6. V.D. Okunev, Z.A. Samoilenko, A. Abal'oshev, P. Gierłowski, A. Klimov, S.J. Lewandowski, Appl. Phys. Lett., 75, 1949, 1999
• 7. H. Hiramatsu, Y. Ohki, D.-S. Shin, L.-H. Choi, Y.-T. Kim, Ferroelectric Thin Films VII Symp., Eds. R.E. Jones, R.W. Schwartz, S.R. Summerfelt, I.K. Yoo, Mater. Res. Soc., Warrendale 1999, p. 293
• 8. A.G. Panfilov, A.I. Rykov, S. Tajima, A. Yamanaka, Phys. Rev. B, 58, 12459, 1998
• 9. S.J. Lewandowski, G. Jung, V.D. Okunev, Z.A. Samoilenko, V.A. Isaev, A. Abal'oshev, P. Gierłowski, A. Klimov, S. Barbanera, Proc. SPIE, 4086, 518, 2000
• 10. H. Kwak, K.C. Chou, J. Guo, H.W.K. Tom, Phys. Rev. Lett., 83, 3745, 1999
• 11. W. Wong-Ng, R.S. Roth, F. Beech, K.L. Davis, Adv. X-ray Anal., 31, 359, 1988
• 12. PDF-3 Database, ICDD, Newtown Square, PA 1999

Identifiers

DOI

10.12693/APhysPolA.101.787