Numerical study of the effect of gas flow in low pressure inductively coupled Ar/N2 plasmas

• Authors: Lizhu Tong
• Languages of publication: EN

Abstracts

EN

The effect of gas flow in low pressure inductively coupled Ar/N2 plasmas operating at the rf frequency of 13.56 MHz and the total gas pressure of 20 mTorr is studied at the gas flows of 5–700 sccm by coupling the plasma simulation with the calculation of flow dynamics. The gas temperature is 300 K and input power is 300 W. The Ar fractions are varied from 0% to 95%. The species taken into account include electrons, Ar atoms and their excited levels, N2 molecules and their seven different excited levels, N atoms, and Ar+, N+, N2
+, N4
+ ions. 51 chemical reactions are considered. It is found that the electron densities increase and electron temperatures decrease with a rise in gas flow rate for the different Ar fractions. The densities of all the plasma species for the different Ar fractions and gas flow rates are obtained. The collisional power losses in plasma discharges are presented and the effect of gas flow is investigated.

Keywords

EN

ICP plasma; gas composition; gas flow rate; coupled calculation

• Publisher: De Gruyter Open
• Journal: Open Physics
• Year: 2012
• Volume: 10
• Issue: 4
• Pages: 888-897

Dates

published

1 - 8 - 2012

online

17 - 7 - 2012

Contributors

author

Lizhu Tong

• Keisoku Engineering System Co., Ltd., 1-9-5 Uchikanda, Chiyoda-ku, Tokyo, 101-0047, Japan

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Identifiers

DOI

10.2478/s11534-012-0034-y