Influence of nanocrystalline structure and composition on hardness of thin films based on TiO2

• Authors: Danuta Kaczmarek , Damian Wojcieszak , Jaroslaw Domaradzki , Eugeniusz Prociow , Frank Placido , Steffen Lapp , Rafal Dylewicz
• Languages of publication: EN

Abstracts

EN

In this work, the influence of Tb-doping on structure, and especially hardness of nanocrystalline TiO2 thin films, has been described. Thin films were formed by a high-energy reactive magnetron sputtering process in a pure oxygen atmosphere. Undoped TiO2-matrix and TiO2:Tb (2 at. % and 2.6 at. %) thin films, had rutile structure with crystallite sizes below 10 nm. The high-energy process produces nanocrystalline, homogenous films with a dense and close packed structure, that were confirmed by X-ray diffraction patterns and micrographs from a scanning electron microscope. Investigation of thin film hardness was performed with the aid of a nanoindentation technique. Results of measurements have shown that the hardness of all manufactured nanocrystalline films is above 10 GPa. In the case of undoped TiO2 matrix, the highest hardness value was obtained (14.3 GPa), while doping with terbium results in hardness decreasing down to 12.7 GPa and 10.8 GPa for TiO2:(2 at. % Tb) and TiO2:(2.6 at. % Tb) thin films, respectively. Incorporation of terbium into TiO2-matrix also allows modification of the elastic properties of the films.

Keywords

EN

hardness; TiO2 ; thin film; terbium; nanocrystalline

• Publisher: De Gruyter Open
• Journal: Open Physics
• Year: 2011
• Volume: 9
• Issue: 2
• Pages: 349-353

Dates

published

1 - 4 - 2011

online

20 - 2 - 2011

Contributors

author

Danuta Kaczmarek

• Faculty of Microsystem Electronics and Photonics, Wroclaw University of Technology, Janiszewskiego 11/17, 50-372, Wroclaw, Poland

author

Damian Wojcieszak

• Faculty of Microsystem Electronics and Photonics, Wroclaw University of Technology, Janiszewskiego 11/17, 50-372, Wroclaw, Poland

author

Jaroslaw Domaradzki

• Faculty of Microsystem Electronics and Photonics, Wroclaw University of Technology, Janiszewskiego 11/17, 50-372, Wroclaw, Poland

author

Eugeniusz Prociow

• Faculty of Microsystem Electronics and Photonics, Wroclaw University of Technology, Janiszewskiego 11/17, 50-372, Wroclaw, Poland

author

Frank Placido

• Thin Film Centre, University of the West of Scotland, High Street, Paisley, PA1 2BE, Scotland

author

Steffen Lapp

• Thin Film Centre, University of the West of Scotland, High Street, Paisley, PA1 2BE, Scotland

author

Rafal Dylewicz

• Department of Electronics & Electrical Engineering, University of Glasgow, Oakfield Avenue, Glasgow, G12 8LT, Scotland

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Identifiers

DOI

10.2478/s11534-010-0112-y