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Number of results

Journal

2010 | 8 | 5 | 798-803

Article title

Photovoltaic cells based on nickel phthalocyanine and zinc oxide formed by atomic layer deposition

Content

Title variants

Languages of publication

EN

Abstracts

EN
The introduction of an ultrathin zinc oxide (ZnO) layer formed by the atomic layer deposition (ALD) technique was found to improve the operation parameters of nickel phthalocyanine (NiPc) based photovoltaic cells with a transparent bottom electrode, indium tin oxide (ITO). This improvement is attributed to several reasons, such as I) increase of photovoltaic yield in ITO/p-NiPc/n-ZnO/Al cells incorporating a hybrid heterojunction as compared to single-layer ITO/NiPc/Al cells, II) enhancement of the overall spectral response in the double-layer cells and III) extension of long-term operational stability.

Publisher

Journal

Year

Volume

8

Issue

5

Pages

798-803

Physical description

Dates

published
1 - 10 - 2010
online
22 - 7 - 2010

Contributors

  • Lviv Polytechnic National University, S. Bandera 12, Lviv, 79013, Ukraine
  • Institute for Physics of Microstructure of the Russian Academy of Sciences (IPM RAS), RF 603950, Nizhny Novgorod, GSP-15, Russia
author
  • Lviv Polytechnic National University, S. Bandera 12, Lviv, 79013, Ukraine
  • Lviv Polytechnic National University, S. Bandera 12, Lviv, 79013, Ukraine
author
  • Institute of Physics, Polish Academy of Sciences, Al. Lotników 32/46, 02-668, Warsaw, Poland
  • Institute of Physics, Polish Academy of Sciences, Al. Lotników 32/46, 02-668, Warsaw, Poland
author

References

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Document Type

Publication order reference

Identifiers

YADDA identifier

bwmeta1.element.-psjd-doi-10_2478_s11534-009-0159-9
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