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Nano-proximity direct ion beam writing

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EN
Focused ion beam (FIB) milling with a 10 nm resolution is used to directly write metallic metasurfaces and micro-optical elements capable to create structured light fields. Surface density of fabricated nano-features, their edge steepness as well as ion implantation extension around the cut line depend on the ion beam intensity profile. The FIB beam intensity cross section was evaluated using atomic force microscopy (AFM) scans of milled line arrays on a thin Pt film. Approximation of two Gaussian intensity distributions describes the actual beam profile composed of central high intensity part and peripheral wings. FIB fabrication reaching aspect ratio of 10 in gold film is demonstrated.
EN
Focused ion beam (FIB) has found a steady and growing use as a tool for fabrication, particularly in the length-scale of micrometres down to nanometres. Traditionally more commonly used for materials characterisation, FIB is continually finding new research areas in a growing number of laboratories. For example, over the last ten years the number of FIB instruments in the U.K. alone has gone from single figures, largely supplied by a single manufacturer, to many tens of instruments supplied by several competing manufacturers. Although the smaller of the two research areas, FIB fabrication has found itself to be incredibly powerful in the modification and fabrication of devices for all kinds of experimentation. Here we report our use of FIB in the production of Superconducting QUantum Interference Devices (SQUIDs) and other closely related devices for metrological applications. This is an area ideally suited to FIB fabrication as the required precision is very high, the number of required devices is relatively low, but the flexibility of using FIB means that a large range of smallbatch, and often unique, devices can be constructed quickly and with very short lead times.
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