Full-text resources of PSJD and other databases are now available in the new Library of Science.
Visit https://bibliotekanauki.pl
Preferences help
enabled [disable] Abstract
Number of results

Results found: 3

Number of results on page
first rewind previous Page / 1 next fast forward last

Search results

Search:
in the keywords:  82.45.Cc
help Sort By:

help Limit search:
first rewind previous Page / 1 next fast forward last
EN
It is well known that anodization process is helpful for obtaining metallic oxides on the metal surfaces. The advantages of this process are used in this study to obtain rough surfaces consisting of titanium oxides and solid solutions of titanium and oxygen. Two different voltages were applied to a pure titanium foil during two process time periods. In all process conditions, titanium oxide thin films were successfully obtained on the base material. Depending on the duration of the process and the voltages applied, the amount and the sizes of oxide particles were changed. EDX analysis combined with SEM and AFM clearly showed that rough surfaces were obtained. Having rough surfaces would be helpful for bonding to another material. However, in the micro-nano scale it is clear that the inhomogeneous mechanical and chemical properties were obtained, most probably resulting in inhomogeneous crack initiation.
EN
We report on the investigation of the surface leakage current for InAs_{1-x}Sb_x (x=0.09) high operation temperature photodiode grown on GaAs substrate in accelerated short-term stability test. The electrochemical passivation technique was proposed to modify the mesa sidewalls properties and obtain anodic sulphur coating covered by SU-8 negative photoresist. The electrical behavior of sulphur anodic film, SU-8 photoresist, and unpassivated devices was compared for devices in variable area diode array test. The surface resistivity for anodic sulphur film, SU-8 and unpassivated devices are equal to 1080, 226, 10200 kΩ cm, respectively, at 150 K and 1340, 429, 2870 kΩ cm, respectively, at 150 K after an exposure of 20 h to atmosphere at 373 K. The Auger recombination process was evaluated as the main mechanism of diffusion current in HOT devices.
EN
The report summarizes peculiarities of synthesis and luminescence properties of porous silicon, porous anodic alumina and artificial opals with the inclusions of sol-gel derived oxides (xerogels), doped with Er, Tb, and Eu. Origin of strong luminescence of lanthanides from xerogels in mesoporous matrices is discussed.
first rewind previous Page / 1 next fast forward last
JavaScript is turned off in your web browser. Turn it on to take full advantage of this site, then refresh the page.