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Study of Tip-Induced Ti-Film Oxidation in Atomic Force Microscopy Contact and Non-Contact Mode

100%
Šoltýs J., Cambel V., Fedor J.
Acta Physica Polonica A
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2003
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vol. 103
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issue 6
553-558
EN
Local anodic oxidation of metals using scanning probe techniques is mostly used for fabrication of isolated gates. The high-resistance oxide created in such a manner divides a thin metallic film into isolated regions. The tip-induced metallic oxide has not so far been used in nanolithography processes as a masking material. The aim of this contribution is to study the technological potential of a TiO_x mask prepared by the local anodic oxidation of a Ti film. Such a mask can be used to complete a nanotechnology process using atomic force microscopy, which can be easily combined with standard optical lithography techniques. We have found that the insulating properties of the oxides prepared in contact and non-contact modes differ strongly - they represent an energy barrier of 200 meV and 400 meV, respectively.
2
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Vortex Dynamics in Ferromagnetic Nanoelements Observed by Micro-Hall Probes

80%
Ščepka T., Šoltýs J., Precner M., Fedor J., Tóbik J., Gregušová D., Gucmann F., Kúdela R., Cambel V.
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vol. 126
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issue 1
390-391
EN
In this work we measure the nucleation and annihilation of magnetic vortices in Pacman-like (PL) micromagnets prepared from Permalloy (Ni_{81}Fe_{19}, Py) at 77 K. Lateral dimensions of explored objects are ≤1 μm with thickness of about 40 nm. The micromagnets are located directly on the high-sensitive micro-Hall probe based on GaAs/AlGaAs heterostructure by lift-off process. Experiments show good agreement of the magnetization reversal with the micromagnetic simulation. Other shapes of micromagnets are also considered to obtain more precise picture of the vortex dynamics.
3
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Study of Magnetic Micro-Ellipses by Cantilever Sensor

80%
Sečianska K., Šoltýs J., Cambel V.
Acta Physica Polonica A
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2017
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vol. 131
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issue 4
833-835
EN
In this paper, we propose a method for prototyping cantilever sensors by means of a modification of commercial atomic force microscopy cantilevers, using electron beam lithography and focused ion beam milling. To overcome obstacles with resist coating related to spin-coating of nonplanar 3D substrates, in this case of free-standing cantilevers, we propose a modified method based on spin-coating technique. An auxiliary atomic force microscopy chip was inserted below the cantilever to quasi-planarize the surface during spin-coating of electron beam resist. Magnetic micro-ellipses were prepared at the free-end of the cantilever by electron beam lithography. We propose a design of a cantilever sensor for the study of magnetic coupling between two cantilevers, prepared by focused ion beam milling. In ideal case, the coupling could be detected by a shift in resonance peaks. Attractive and repulsive forces between magnetic structures were shown by magnetic force microscopy.
4
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Materials Patterning and Characterisation at the Nanometre Scale Using Focused MeV Ion Beams: Present Achievements and Future Prospects

80%
Grime G.
Acta Physica Polonica A
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2009
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vol. 115
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issue 2
467-472
EN
A key phenomenon in the interaction of MeV ions and solids is that the energy transferred from the primary ions to the target electrons is high compared with atomic and molecular binding energies, but low compared with the ion energy. This means that there is a high probability of modifying the chemical properties of the material (for patterning) or of inducing the emission of electromagnetic radiation (for analysis), yet the path of particle is changed by a negligible amount, which means that focused beams remain sharp even after penetrating long depths into the material. Developments in focusing MeV ions in recent years have pushed the useable beam diameters into the sub-micrometre region, which means that nuclear microbeams are poised to make an impact in both direct write fabrication and micro-analysis at length scales of interest in nanotechnology or microbiology. This paper reviews the science and technology underlying the use of nuclear microbeams (ion solid interactions, focusing systems) and reports on the present status and trends of applications in sub-micron scale applications.
5
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Nanoscale Pattern Definition by Edge Oxidation of Silicon under the Si_{3}N_{4} mask - PaDEOx

70%
Zaborowski M., Grabiec P., Dobrowolski R., Panas A., Skwara K., Szmigiel D., Wzorek M.
Acta Physica Polonica A
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2009
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vol. 116
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issue S
S-139-S-141
EN
Well-controlled method of Si nanopattern definition - pattern definition by edge oxidation have been presented. The technique is suitable for fabrication of narrow paths of width ranged from several tens of nm to several μm by means of photolithography equipment working with μm-scale design rules. Process details influencing a shape of the Si pattern have been discussed. SEM examinations have been presented.
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