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Diffusion of Potassium on Nickel

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Błaszczyszynowa M., Błaszczyszyn R.
Acta Physica Polonica A
|
1992
|
vol. 81
|
issue 2
285-294
EN
The surface diffusion of a potassium dose corresponding to the average coverage Θ̅_{K} = 1.5 on nickel was studied using the field emission technique in the temperature range of 78-133 K. In general, under such conditions diffusion proceeds with the sharp moving boundary and the activation energy Q from 0.16 eV to 0.36 eV dependently on the crystallographic directions. Free boundary migration with the energy Q < 0.16 eV is expected on the close-packed regions {111} and {001} already at liquid N_{2} temperature. The results are discussed in relation to the atomic structure of the nickel substrate taking into account the interaction in the adsorption layer.
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