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On the Role of Radicals in Kinetics of Plasma Etchers in Ar/CF_4 Mixtures

100%
Nikitović Ž., Stojanović V., Petrović Z.
Acta Physica Polonica A
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2009
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vol. 115
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issue 4
765-767
EN
In this paper we present the transport coefficients in Ar/CF_4 mixtures with realistic abundances of CF_x radicals, F atoms, and F_2 molecules that are standard products of plasma chemistry in plasma etching systems and are present in large abundances of the order of few percent in realistic plasma etching devices. It was found that, although radicals make a minimum impact on distribution function and mean energy, the effect on drift velocity is significant and the effect on rates of attachment is large and may change the mode of operation of plasmas.
2
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Use of Quantum Mechanical Methods to Obtain a Bohm-Type Coefficient of Diffusion

100%
Jiménez-Domínguez H.
Acta Physica Polonica A
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2009
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vol. 116
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issue 2
197-202
EN
A Bohm-type coefficient of diffusion is obtained by means of a procedure starting from the Hamiltonian of a single electron in a dilute plasma in the presence of an external, uniform magnetic field of constant magnitude and an electrical potential that serves to simulate an electrical fluctuation which drives the guiding center drift. Using the concept of the differentiation of operators with respect to time, the formula for the well-known E × B drift velocity is recovered. Finally, the solution of a quantum mechanical equation of motion for the guiding center is found in the quasi-classical approximation to obtain a diffusion coefficient.
3
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Use of Quantum Mechanical Methods to Obtain a Bohm-Type Coefficient of Diffusion. Part II

75%
Jiménez-Domínguez H.
Acta Physica Polonica A
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2011
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vol. 119
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issue 6
798-802
EN
The research reported in an article previously published in this journal is pursued here further on. A staircase profile of the graphical representation of the absolute value of the expression for Bohm-type diffusion in two dimensions is analyzed allowing the suggestion that its shape could be related to the well-known structure of levels of the quantized square of the guiding center radius vector and that this structure could be responsible for the appearance of the successive steps in such a profile. When these considerations are taken into account, the expression for Bohm-type diffusion in two dimensions is normalized according to the formula for the quantized square of the guiding center radius vector and a diffusion coefficient whose value is 4/π times the Bohm diffusion coefficient is obtained for large values of the independent variable.
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