Full-text resources of PSJD and other databases are now available in the new Library of Science.
Visit https://bibliotekanauki.pl
Preferences help
enabled [disable] Abstract
Number of results

Results found: 4

Number of results on page
first rewind previous Page / 1 next fast forward last

Search results

Search:
in the keywords:  42.70.Ln
help Sort By:

help Limit search:
first rewind previous Page / 1 next fast forward last
EN
Photonic crystal structures are fabricated in dichromated pullulan by the holographic technique. Relief structures of photonic lattices with rectangular, rhombic, and hexagonal arrays of peaks and holes are obtained. The structures have periodicities of the order 1.1μm and depth of about 50 nm.
2
100%
EN
Methylene blue sensitized poly(methyl methacrylate) prepared by the process of dye diffusion has been shown to be efficient medium for recording interference gratings. Phase and/or amplitude holograms can be written in the methylene blue sensitized films of poly(methyl methacrylate) using a conventional source of light a He-Ne laser operating at 632.8 nm wavelength. Kinetics of photobleaching process of methylene blue is measured. Diffraction efficiencies of up to 30% were found for thick holograms. Phase conjugation and multiple holograms writing has been tested in the studied system.
EN
The samples of thin film (d ≈ 40 nm) tetrahedral amorphous carbon (ta-C), deposited by the filtered cathodic vacuum arc have been implanted with N⁺ at a fluence of 3×10¹⁴ cm¯² and ion energy E=20 keV. The induced structural modification of the implanted material results in a considerable change of its optical properties, best manifested by a significant shift of the optical absorption edge to lower photon energies as obtained from optical transmission measurements. This shift is accompanied by a considerable increase of the absorption coefficient (photodarkening effect) in the measured wavelength range (350÷2500 nm). These effects could be attributed to both the additional defect introduction and the increased graphitization, as confirmed by the X-ray photoelectron spectroscopy measurements. The optical contrast thus obtained (between implanted and unimplanted film materials) could be made use of in the area of high-density optical data storage using the focused ion beams.
EN
Topographic and optical patterns have been fabricated in a-SiC films with a focused high-energy (1 MeV) H^{+} and He^{+} ion beam and examined with near-field techniques. The patterns have been characterized with atomic force microscopy and scanning near-field optical microscopy to reveal local topography and optical absorption changes as a result of the focused high-energy ion beam induced modification. Apart of a considerable thickness change (thinning tendency), which has been observed in the ion-irradiated areas, the near-field measurements confirm increases of optical absorption in these areas. Although the size of the fabricated optical patterns is in the micron-scale, the present development of the technique allows in principle writing optical patterns up to the nanoscale (several tens of nanometers). The observed values of the optical contrast modulation are sufficient to justify the efficiency of the method for optical data recording using high-energy focused ion beams.
first rewind previous Page / 1 next fast forward last
JavaScript is turned off in your web browser. Turn it on to take full advantage of this site, then refresh the page.