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Application of DC Magnetron Sputtering for Creation of Gas-Sensitive Indium Oxide Thin Films and Their Properties

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Luhin V., Zharsky I., Zhukowski P.
Acta Physica Polonica A
|
2013
|
vol. 123
|
issue 5
837-839
EN
In this paper the technology of gas sensitive semiconductor structures based on indium oxide thin films by DC magnetron sputtering of indium with the subsequent thermal oxidation is developed. Structure, surface morphology and chemical composition of the obtained films have been investigated by electron diffraction, scanning electron microscopy, Auger electron spectroscopy, and X-ray photoelectron spectroscopy. Conditions of In_2O_3 films formation with high selectivity and sensitivity to NO_2, and NH_3 are established.
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