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Influence of Thermal Oxidation Temperatures on the Structural and Morphological Properties of MoO_3 Thin Films

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Hojabri A., Hajakbari F., Emami Meibodi A., Moghri Moazzen M.
Acta Physica Polonica A
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2013
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vol. 123
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issue 2
307-308
EN
In this study, molybdenum (Mo) thin films have been deposited on Si substrate by dc magnetron sputtering. Then for preparation of MoO_3 thin films the thermal oxidation of Mo thin films under the oxygen flow was employed in the electrical furnace. The influence of the different thermal oxidation temperatures at 400, 600, 800 and 1000C on the structural and morphological properties of MoO_3 thin films were characterized by X-ray diffraction and atomic force microscopy, respectively. The results show that the crystallinity and surface morphology of the films are strongly dependent on the thermal oxidation temperatures.
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