The growth of (RE)_{1} Ba_{2}Cu_{3}O_{7-δ} (RE: Y, Nd) films on NdGaO_{3} and SrTiO_{3} substrates by ion-beam and dc-/rf-magnetron sputter deposition is discussed in the framework of growth kinetics, oxygen exchange, epitaxial relations, substrate crystal orientation, in-plane coherence, vicinal substrate cuts, overgrowth on steps, superconductor/insulator combinations, and patterning by ion-beam etching. The process conditions for ion-beam and magnetron sputter deposition are briefly outlined.
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