Using X-ray microanalysis and scanning electron microscopy Zn-Ni-SiO_2 plating containing SiO_2 nanoparticles were studied. It was found that X-ray irradiation of the electrolyte leads to the increased Ni concentration in Zn-Ni-SiO_2(X) films and the grain size is also increasing (the grain size is twice that in the unirradiated case). A thickness of Zn-Ni-SiO_2(X) plating is 20 μm and a thickness of the Zn-Ni-SiO_2 plating is about 15 μm. The surface morphology was studied using AFM method. Increasing Ni concentration and Ni_5Zn_{21} phase due to X-Ray irradiation of the electrolyte leading to the improved mechanical properties of the coating.
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