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High Temperature Annealing of Ion-Plasma Nanostructured Coatings Based on AlN-TiB_2(TiSi_2)

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Pogrebnjak A., Abadias G., Bondar O., Sobol O., Beresnev V., Pshyk A., Demianenko A., Belovol K., Kolesnikov D., Komsta H.

Acta Physica Polonica A

2014

vol. 125

issue 6

1284-1287

The coatings investigated in this paper were deposited via the magnetron sputtering of AlN-TiB_2-Ti-Si_2 target in Ar atmosphere. The investigation of structural-phase composition, element composition, morphology and mechanical properties before and after annealing up to 1350°C was carried out. The concentration of elements in the coating was changed after annealing at 900°C and further annealing at 1350°C (especially after annealing at 1350°C). The hardness of as-deposited coatings was 15 GPa, but after annealing at 1350°C the value of hardness increased up to 22÷23.5 GPa. The value of the viscoplastic index was 0.07. All this provide high damping properties of the coating, and amorphous-like structure makes promising the use of these coatings as diffusion barriers in the form of independent elements, and as a contacting layer in multilayer wear resistant coatings.

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1 Acta Physica Polonica A

1 2014

1 Abadias G.

1 Belovol K.

1 Beresnev V.

1 Bondar O.

1 Demianenko A.

1 Kolesnikov D.

1 Komsta H.

1 Pogrebnjak A.

1 Pshyk A.

1 Sobol O.

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High Temperature Annealing of Ion-Plasma Nanostructured Coatings Based on AlN-TiB_2(TiSi_2)