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Imaging and Patterning on Nanometer Scale Using Coherent EUV Light

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Wachulak P., Marconi M., Menoni C., Rocca J., Fiedorowicz H., Bartnik A.

Acta Physica Polonica A

2010

vol. 117

issue 2

403-407

Extreme ultraviolet (EUV) covers wavelength range from about 5 nm to 50 nm. That is why EUV is especially applicable for imaging and patterning on nanometer scale length. In the paper periodic nanopatterning realized by interference lithography and high resolution holographic nanoimaging performed in a Gabor in-line scheme are presented. In the experiments a compact table top EUV laser was used. Preliminary studies on using a laser plasma EUV source for nanoimaging are presented as well.

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1 Acta Physica Polonica A

1 2010

1 Bartnik A.

1 Fiedorowicz H.

1 Marconi M.

1 Menoni C.

1 Rocca J.

1 Wachulak P.

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Imaging and Patterning on Nanometer Scale Using Coherent EUV Light