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Deposition of Amorphous Hydrogenated Carbon Coatings by Plasma Jet

100%

Marcinauskas L., Grigonis A., Manikowski H., Valincius V.

Acta Physica Polonica A

2008

vol. 113

issue 3

1063-1066

In this study amorphous hydrogenated carbon films (a-C:H) were formed on Si (111) from an Ar-C_2H_2 and Ar-C_2H_2-H_2 gas mixtures at 1000 Pa pressure using a plasma jet chemical vapour deposition. It is shown that by varying the Ar:C_2H_2 ratio and adding the hydrogen gas in plasma, the structure, surface morphology, growth rate of the coatings, and consequently their optical properties can be controlled.

Influence of the Oxygen Plasma Treatment on Carbon Electrode and Capacity of Supercapacitors

100%

Kavaliauskas Z., Marcinauskas L., Valincius V.

Acta Physica Polonica A

2014

vol. 125

issue 6

1316-1319

Amorphous carbon electrodes were deposited using atmospheric pressure plasma torch from the mixture of argon and acetylene gases on the stainless steel substrates. The ratio of Ar/C_2H_2 was in the range of 15-55. The deposited coatings were immersed in low pressure oxygen plasma for 1 min. Scanning electron microscopy images show that when Ar/C_2H_2 ratio increases from 15 to 55, the electrodes surface roughness decreases. The Raman scattering spectroscopy results indicated that the I_{D}/I_{G} ratio decreases from 2.04 to 1.35. It was observed that with the increase of Ar/C_2H_2 ratio from 15 to 55, the capacity of supercapacitor increases from 16 mF to 36 mF. The electric capacity of capacitors has increased up to 7 times after their exposure in oxygen plasma.

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2 Acta Physica Polonica A

1 2014

1 2008

2 Marcinauskas L.

2 Valincius V.

1 Grigonis A.

1 Kavaliauskas Z.

1 Manikowski H.

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Deposition of Amorphous Hydrogenated Carbon Coatings by Plasma Jet

Influence of the Oxygen Plasma Treatment on Carbon Electrode and Capacity of Supercapacitors