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Effects of Thermal Annealing and Film Thickness on the Structural and Morphological Properties of Titanium Dioxide Films

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Çörekçí S., Kızılkaya K., Asar T., Öztürk M., Çakmak M., Özçelík S.
Acta Physica Polonica A
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2012
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vol. 121
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issue 1
247-248
EN
Titanium dioxide (TiO_2) thin films having different thicknesses of 220, 260, and 300 nm were deposited onto well-cleaned n-type silicon substrates by reactive DC magnetron sputtering and annealed in the range of 200-1000C in steps of 200°C. The effects of thermal annealing and thickness variation on the crystalline quality and surface morphology of the films were investigated by X-ray diffraction and atomic force microscopy measurements. It was found that the film quality and morphology depend on the annealing temperature. TiO_2 films exhibit a grain-like surface morphology. The root-mean-square roughness and grain size on the surface increase as a result of increasing film thickness.
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