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EN
Nanostructured thin-film coatings based on titanium nitride, doped with silicon, chromium and aluminium were the object of this study. The creation of a smooth transition layer was carried out by the changing of a supplying nitrogen flow to the vacuum chamber during the application. TiSiN, TiCrN and TiAlN coatings were deposited. The studies of the structure, elemental and phase composition of the coatings were carried out. Also, the performance of coatings was investigated. The results can be used in today's technology, such as mechanical engineering.
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