TiAlN, TiSiN, and TiCrN composite layers were deposited by magnetron sputtering and sliding - angle ion beam sputtering of the inner surface of hollow truncated cones of different compositions. The composition of both type coatings and component depth distributions were studied by the Rutherford backscattering spectrometry. The structural and phase analyses of the deposited films were performed by transmission electron microscopy and diffraction. Microhardness, wear resistance and friction coefficient of the coatings were also measured and discussed in the relationship with the structure and composition. Microhardness tests showed that the registered data varied in the range 10 to 50 GPa, depending on composition and concentration of components. The best wear protection results from the magnetron deposited Ti-Al-N systems in a narrow range of component concentrations. A minimal friction coefficient was revealed for the magnetron sputtered layers.
NbN and Nb-Si-N films were deposited by magnetron sputtering the Nb and Si targets on silicon wafers at various bias voltages, Uₛ. The deposited films were annealed to establish their thermal stability. The films were investigated by atomic force microscope, X-ray diffraction, X-ray photoelectron spectroscopy and nanoindentation. The NbN films were nanostructured, and the Nb-Si-N films had a nanocomposite structure, and represented an aggregation of δ-NbNₓ nanocrystallites embedded into the amorphous Si₃N₄ tissue (nc-δ-NbNₓ/a-Si₃N₄).
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