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Pulsed Laser Deposition of Amorphous Co-Fe-Ni-Si-B Thin Films

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Gareev R. R., Alimpiev S. S., Bugoslavskii Y. V., Nikiforov S. M., Maslov A. I., Shubnii G. Y., Zherichin A. N.

Acta Physica Polonica A

1997

vol. 91

issue 2

321-324

Soft magnetic multicomponent Co-Fe-Ni-Si-B thin films have been grown by pulsed laser deposition onto single-crystal sapphire and silicon substrates. The static hysteresis measurements for different substrate temperatures are presented. Thin films with a coercive force smaller than 1 Oe were grown at substrate temperatures from 250°C to 350°C. X-ray diffraction measurements proved that the structure of films is amorphous. The surface morphology of grown thin films was observed by scanning electron microscopy. The chemical composition of deposited films corresponds to the composition of bulk alloy.

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1 Acta Physica Polonica A

1 1997

1 Alimpiev S. S.

1 Bugoslavskii Y. V.

1 Gareev R. R.

1 Maslov A. I.

1 Nikiforov S. M.

1 Shubnii G. Y.

1 Zherichin A. N.

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Pulsed Laser Deposition of Amorphous Co-Fe-Ni-Si-B Thin Films