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Implantation Temperature Effects on the Nanoscale Optical Pattern Fabrication in a-SiC:H Films by Ga^{+} Focused Ion Beams

100%

Tsvetkova T., Wright C., Hosseini P., Bischoff L., Zuk J.

Acta Physica Polonica A

2013

vol. 123

issue 5

952-955

This work is related to a novel approach of providing some new generation ultrastable (> 50 years), ultrahigh density (> 1 Tbit/sq.in.) data storage for archival applications. We used ion-implantation to write nanoscale data into hydrogenated amorphous silicon carbide (a-SiC:H) films. Wide bandgap a-SiC:H samples, Ga^{+} focused ion beam implanted, have been prepared. A range of samples has been focused ion beam patterned under different implantation conditions, with emphasis on different substrate temperatures (typically from 0C temperature to around room temperature). Some of the room temperature implanted samples were further annealed at + 250C in vacuum. The focused ion beam patterned samples were then analysed using near-field techniques, like atomic force microscopy, to define optimum implantation conditions and the resulting consequences for archival data storage applications. The atomic force microscopy analysis of Ga^{+} focused ion beam implanted a-Si_{1-x}C_{x}:H samples at room temperature and at 0C revealed an increase of both the depth and the width of the individual lines within the focused ion beam written patterns at the lower temperature, as a result of an increased ion beam induced sputtering yield, in good agreement with the previous results for the case of Ga^+ broad beam implantation in a-Si_{1-x}C_{x}:H and again suggesting that the best conditions for optical data storage for archival storage applications would be using Ga^+ ion implantation in a-SiC:H films with an optimal dose at room temperatures. Similarly, the atomic force microscopy results confirm that no advantage is expected to result from post-implantation annealing treatments.

Ion Beam Induced Surface Modification of ta-C Thin Films

86%

Berova M., Sandulov M., Tsvetkova T., Kitova S., Bischoff L., Boettger R.

Acta Physica Polonica A

2017

vol. 132

issue 2

299-301

Thin film samples (d ≈40 nm) of tetrahedral amorphous carbon (ta-C), deposited by filtered cathodic vacuum arc, were implanted with Ga⁺ at ion energy E =20 keV and ion fluences D=3×10¹⁴-3×10¹⁵ cm¯² and N⁺ with the same energy and ion fluence D=3×10¹⁴ cm¯². The Ga⁺ ion beam induced surface structural modification of the implanted material, displayed by formation of new phase at non-equilibrium condition, which could be accompanied by considerable changes in the optical properties of the ta-C films. The N⁺ implantation also results in modification of the surface structure. The induced structural modification of the implanted material results in a considerable change of its topography and optical properties. Nanoscale topography and structural properties characterisation of the Ga⁺ and N⁺ implanted films were performed using atomic spectroscopy analysis. The observed considerable surface structural properties modification in the case of the higher fluence Ga⁺ implanted samples results from the relatively high concentration of introduced Ga⁺ atoms, which is of the order of those for the host element.

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2 Acta Physica Polonica A

1 2017

1 2013

2 Bischoff L.

2 Tsvetkova T.

1 Berova M.

1 Boettger R.

1 Hosseini P.

1 Kitova S.

1 Sandulov M.

1 Wright C.

1 Zuk J.

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Implantation Temperature Effects on the Nanoscale Optical Pattern Fabrication in a-SiC:H Films by Ga^{+} Focused Ion Beams

Ion Beam Induced Surface Modification of ta-C Thin Films