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Analysis of Thin Films by Time-of-Flight Low Energy Ion Scattering

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Průša S., Kolíbal M., Bábor P., Mach J., Šikola T.

Acta Physica Polonica A

2007

vol. 111

issue 3

335-341

In the paper the design and application of a time-of-flight low energy ion scattering instrument built into an UHV complex deposition and analytical apparatus is described. A special attention is aimed at demonstrating the ability of time-of-flight low energy ion scattering to analyse near-to-surface layers of thin films prepared both ex situ and in situ. It is shown that the broadening of peaks in time-of-flight low energy ion scattering spectra can be attributed to multiple scattering and inelastic losses of ions in deeper layers. As a result of that, the peak width of ultrathin films depends on their thickness.

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1 Acta Physica Polonica A

1 2007

1 Bábor P.

1 Kolíbal M.

1 Mach J.

1 Průša S.

1 Šikola T.

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Analysis of Thin Films by Time-of-Flight Low Energy Ion Scattering