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EN
The dynamics of the lattice relaxation processes were investigated us­ing a reflection of a high energy electron diffraction analysis system dur­ing growth by molecular beam epitaxy of ZnTe/Cd_{1-x}Ζn_{x}Te/Cd_{0.5}Mn_{0.5}Te buffers on GaAs substrates. The variation of the lattice parameter recorded by the high energy electron diffraction during the growth was later confirmed by an analysis of high resolution transmission electron microscopy images. We report also on an observation of oscillations of the lattice parameter during the deposition of several first layers of ZnTe on CdTe.
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