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TiO2-assisted photodegradation of pharmaceuticals - a review

100%

Tong A., Braund R., Warren D., Peake B.

Open Chemistry

2012

vol. 10

issue 4

989-1027

Pharmaceutical compounds have been detected in the environment and potentially arise from the discharge of excreted and improperly disposed medication from sewage treatment facilities. In order to minimize environmental exposure of pharmaceutical residues, a potential technique to remove pharmaceuticals from water is the use of an advanced oxidation process (AOP) involving titanium dioxide (TiO2) photocatalysis. To evaluate the extent UV/TiO2 processes have been studied for pharmaceutical degradation, a literature search using the keywords ‘titanium dioxide’, ‘photocatalysis’, ‘advanced oxidation processes’, ‘pharmaceuticals’ and ‘degradation’ were used in the ISI Web of Knowledge TM, Scopus TM and ScienceDirect TM databases up to and including articles published on 23 November 2011. The degradation rates of pharmaceuticals under UV/TiO2 treatment were dependent on type and amount of TiO2 loading, pharmaceutical concentration, the presence of electron acceptors and pH. Complete mineralization under particular experimental conditions were reported for some pharmaceuticals; however, some experiments reported evolution of toxic intermediates during the photocatalytic process. It is concluded that the UV/TiO2 system is potentially a feasible wastewater treatment process, but careful consideration of the treatment time, the loading and the type of TiO2 (doped vs. undoped) used for a particular pharmaceutical is necessary for a successful application (198 words). [...]

Structural study of TiO2 thin films by micro-Raman spectroscopy

72%

Niilisk A., Moppel M., Pärs M., Sildos I., Jantson T., Avarmaa T., Jaaniso R., Aarik J.

Open Physics

2006

vol. 4

issue 1

105-116

The Raman spectroscopy method was used for structural characterization of TiO2 thin films prepared by atomic layer deposition (ALD) and pulsed laser deposition (PLD) on fused silica and single-crystal silicon and sapphire substrates. Using ALD, anatase thin films were grown on silica and silicon substrates at temperatures 125–425 °C. At higher deposition temperatures, mixed anatase and rutile phases grew on these substrates. Post-growth annealing resulted in anatase-to-rutile phase transitions at 750 °C in the case of pure anatase films. The films that contained chlorine residues and were amorphous in their as-grown stage transformed into anatase phase at 400 °C and retained this phase even after annealing at 900 °C. On single crystal sapphire substrates, phase-pure rutile films were obtained by ALD at 425 °C and higher temperatures without additional annealing. Thin films that predominantly contained brookite phase were grown by PLD on silica substrates using rutile as a starting material.

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1 Braund R.

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1 Moppel M.

1 Niilisk A.

1 Peake B.

1 Pärs M.

1 Sildos I.

1 Tong A.

1 Warren D.

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TiO2-assisted photodegradation of pharmaceuticals - a review

Structural study of TiO2 thin films by micro-Raman spectroscopy