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Production of Molybdenum and Tantalum Ion Beams using CCl₂F₂

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Turek M., Droździel A., Pyszniak K., Filiks J., Prucnal S., Mączka D., Vaganov Y., Węgierek P.

Acta Physica Polonica A

2017

vol. 132

issue 2

283-287

A new method of refractory metal (like Mo and Ta) ion beam production using the arc discharge ion source and CCl₂F₂ (dichlorodifluoromethane) used as a feeding gas supported into the discharge chamber is presented. It is based on etching of the refractory metal parts (e.g. anode or a dedicated tube) Cl and F containing plasma. The results of measurements of the dependences of ion currents on the working parameters like discharge and filament currents as well as on the magnetic field flux density of an external electromagnet coil are shown and discussed. The separated Mo⁺ and Ta⁺ beam currents of approximately 22 μA and 2 μA, respectively, were obtained.

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1 Acta Physica Polonica A

1 2017

1 Droździel A.

1 Filiks J.

1 Mączka D.

1 Prucnal S.

1 Pyszniak K.

1 Turek M.

1 Vaganov Y.

1 Węgierek P.

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Production of Molybdenum and Tantalum Ion Beams using CCl₂F₂