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EN
Various imaging methods and techniques capable of reaching a nanometer spatial resolution are currently under development. One of them is an extreme ultraviolet microscopy, based on the Fresnel zone plates. In this paper a compact, high-repetition, laser-plasma EUV source, with a gas puff target, capable of emitting quasi-monochromatic radiation at 13.8 nm wavelength was used in the first demonstration of a desk-top EUV transmission microscopy with a spatial (half-pitch) resolution of 50 nm. EUV microscopy images of objects with various thicknesses and the spatial resolution measurements using the knife-edge test are presented.
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EUV-Induced Nanostructuring of Solids

76%
EN
In this work results of investigations concerning nanostructuring of polymers and some other solids using a laser-plasma extreme ultraviolet source are presented. The plasma radiation was produced using a gas puff target and focused with a gold-plated grazing incidence ellipsoidal collector. Decomposition process of polymers was investigated using a quadrupole mass spectrometer. Different kinds of micro- and nanostructures created in near-surface layers of the materials were investigated using scanning electron microscope. Forms of the structures depend on a particular material and the extreme ultraviolet exposure. In case of some polymers even a single shot is sufficient for creation of the visible changes in surface morphology. In case of inorganic solids visible changes require usually the exposure with tens or hundreds of extreme ultraviolet pulses.
EN
A laser-plasma extreme ultraviolet source equipped with grazing incidence and Mo/Si collectors was used for surface modification of selected polymers. Surface morphology after irradiation was investigated. Different forms of nanostructures were obtained depending on polymer and irradiation conditions.
EN
In this paper, results of surface modification, using a laser-produced plasma source of extreme ultraviolet, and the extreme ultraviolet induced low temperature plasmas, are presented. It was shown that irradiation of different materials by intense extreme ultraviolet pulses results in strong changes of the surface morphology. Examples of micro- and nanostructures obtained this way are presented. It was also demonstrated that a dual action of the radiation pulses and low temperature plasmas allows to modify a molecular structure of exposed materials.
EN
Laser plasma with temperature of the order of tens eV can be an efficient source of extreme ultraviolet (EUV). The radiation can be focused using different kind of optics, giving sufficient fluence for some applications. In this work we present results of investigations concerning applications of a laser plasma EUV source based on a double stream gas puff target. The source was equipped with two different grazing incidence collectors. One of them was a multifoil collector, the second one was an axisymmetrical ellipsoidal collector. The multifoil mirror was used mainly in experiments concerning micromachining of organic polymers by direct photo-etching. The experiments were performed for different polymers that were irradiated through a fine metal grid as a contact mask. The smallest element of a pattern structure obtained in this way was 5 μm, while the structure height was 50 μm giving an aspect ratio about 10. The laser-plasma EUV source equipped with the axisymmetrical ellipsoidal collector was used for surface modification of organic polymers and inorganic solids. The surface morphology after irradiation was investigated. Different forms of micro- and nanostructures were obtained depending on material and irradiation conditions.
EN
The degree of the biocompatibility of polycarbonate (PC) polymer used as biomaterial can be controlled by surface modification for various biomedical engineering applications. In the past, PC samples were treated by excimer laser for surface reorganization however associated process alteration of bulk properties is reported. Extreme ultraviolet radiation can be employed in order to avoid bulk material alteration due to its limited penetration. In this study, a 10 Hz laser-plasma EUV source based on a double-stream gas-puff target irradiated with a 3 ns and 0.8 J Nd:YAG laser pulse was used to irradiate PC samples. The PC samples were irradiated with different number of EUV shots. Pristine and EUV treated samples were investigated by scanning electron microscopy and atomic force microscopy for detailed morphological characterization of micropatterns introduced by the EUV irradiation. Associated chemical modifications were investigated by X-ray photoelectron spectroscopy. Pronounced wall-type micro- and nanostructures appeared on the EUV modified surface resulting in a change of surface roughness and wettability.
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