Determination of the integral characteristics of structural perfection of a real crystal (i.e. Debye-Waller's static factor e^{-L} and coefficient of absorption lids due to diffuse scattering) is especially expedient using the suitably selected wavelengths of the X-ray continuous spectrum by investigation of the thickness I(t), coordinate I(x) as well as amplitude I(W) dependencies of intensities at Lane or Bragg diffraction. Here W is an amplitude of weak ultrasound vibrations excited in a sample for suppression of the Bragg component of reflectivity.
The effect of high temperature (up to 1120°C)-high pressure (up to 1.1 GPa) treatment on the resulting defect structure of preannealed (450-725°C, up to 96 hours) Czochralski grown Si crystals was studied by X-ray diffraction. The values of the Debye-Waller static factor and of the root-mean-square atomic displacement due to defects were determined for various Lane reflections. Well-defined development of the cluster like defect structure after high temperature pressurization depending to a substantial extent on the preannealing conditions was observed.
Sensitivity of X-ray integral reflectivity of GaAs single crystal to a degree of structure distortions was established to grow considerably in the Bragg diffraction case when the characteristic AgK_{α_{1}} line is changed for more hard white radiation. In effect, the absorption length essentially exceeds the extinction length what results in enhancement of incoherent scattering. Measurements of X-ray integral reflectivity coordinate dependence by single crystal spectrometer permitted to determine the mean level of crystal lattice distortion as well as the degree of structure homogeneity of a sample with dislocations. The Debye-Waller static factor value was estimated from X-ray integral reflectivity magnitudes for the 800 reflection of white radiation.
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