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Wide bandpass optical filters with TiO2 and Ta2O5

100%
Asghar M., Shoaib M., Placido F., Naseem S.
Open Physics
|
2008
|
vol. 6
|
issue 4
853-863
EN
Complex multilayer thin film filters for optical applications have been designed, prepared and characterized in this work. E-beam reactive evaporation technique has been used as a deposition process. In the first stage, optimized individual film layers of TiO2, Ta2O5, and SiO2 are deposited and characterized optically and structurally before the deposition of multilayered structures. The filter designs are based upon 33 layered SiO2/TiO2 and SiO2/Ta2O5 configurations on glass substrate. These designs are optimized to achieve wideband transmission in the visible spectrum. After deposition, the two filter configurations are characterized optically and structurally using spectrophotometery, atomic force microscopy (AFM), X-ray diffraction (XRD) and scanning electron microscopy (SEM). SiO2/Ta2O5/glass filter has been found sensitive to deposition conditions since high absorption is observed in multilayered configuration for the as-deposited samples. Post-deposition annealing of the filter in the temperature range 150 to 250°C was also performed in order to study the effect of temperature on absorption and spectral characteristics of the filter. Comparison of the two filter configurations was also performed to analyze their suitability for optical applications. Adhesion of the two filters was found to be very good by means of tape-peel test.
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Influence of nanocrystalline structure and composition on hardness of thin films based on TiO2

76%
Kaczmarek D., Wojcieszak D., Domaradzki J., Prociow E., Placido F., Lapp S., Dylewicz R.
Open Physics
|
2011
|
vol. 9
|
issue 2
349-353
EN
In this work, the influence of Tb-doping on structure, and especially hardness of nanocrystalline TiO2 thin films, has been described. Thin films were formed by a high-energy reactive magnetron sputtering process in a pure oxygen atmosphere. Undoped TiO2-matrix and TiO2:Tb (2 at. % and 2.6 at. %) thin films, had rutile structure with crystallite sizes below 10 nm. The high-energy process produces nanocrystalline, homogenous films with a dense and close packed structure, that were confirmed by X-ray diffraction patterns and micrographs from a scanning electron microscope. Investigation of thin film hardness was performed with the aid of a nanoindentation technique. Results of measurements have shown that the hardness of all manufactured nanocrystalline films is above 10 GPa. In the case of undoped TiO2 matrix, the highest hardness value was obtained (14.3 GPa), while doping with terbium results in hardness decreasing down to 12.7 GPa and 10.8 GPa for TiO2:(2 at. % Tb) and TiO2:(2.6 at. % Tb) thin films, respectively. Incorporation of terbium into TiO2-matrix also allows modification of the elastic properties of the films.
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