The effect of resonance, observed in X-ray waveguide layered structures in a characteristic way influences the scattering properties of the films. It is well known that in the resonant region the reflectivity shows a series of minima, usually very deep and extremely narrow. The positions and depths of the minima depend only on X-ray waveguide structural properties, on the X-ray wavelength and on the incident beam divergence. In the present work we propose and discuss the application of the X-ray waveguide and quasi X-ray waveguide film structures as tools to experimental evaluation of some quantities related to X-ray reflectometric or diffractometric measurements, like the beam divergence, wavelength, or angular distance. Examples of application of the X-ray waveguide as an excellent tool to estimate the effective beam divergence are shown. Properties of the X-ray waveguide elements as a handy wavelength or angular calibration standard are also mentioned.
The X-ray standing wave technique has demonstrated in these last years to be a powerful method in the study of interfaces. In this paper the fundamentals of the technique will be given, together with examples of applications in the field of metal-semiconductor, of buried semiconductor-semiconductor interfaces and in structural studies of Langmuir-Blodgett films.
The glancing-angle reflectivity profiles in samples containing an X-ray waveguide layer are studied. Oscillations observed at angles within the region of resonance and above, are interpreted by angle dependent interference of the monochromatic X-ray beam in thin layer. The discussion is extended to the structures composed of more than one layer. Experimental reflectivity spectra recorded with Cu K_{α} radiation are compared with the theoretical calculations. It leads to the model of oscillations in reflectivity consistent both for the resonant and non-resonant regions, and clarifies interpretation of oscillations in the region above the resonances. A brief discussion of potential applications of the reflectivity spectra to the studies of structure of thin layers is done.
In this work we present the new experimental results of total photoelectric yield as well as energy distribution of photoelectrons excited in a thin carbon film deposited on Ni mirror in the presence of resonance-enhanced X-ray propagation effect. The measurements were performed using conventional X-ray tube as a radiation source for the energy Cu K_{α} (8047 keV). The spectra were recorded using a flow proportional electron counter with energy resolution of about 15%, and multichannel pulse height analyzer. A comparison with the reflectivity spectra recorded at the same time show an excellent correlation of both kinds of spectra, consistently with the theoretical prediction. A map of electron energy distribution is reported. Although the applied electron counter was of low energetic resolution the recorded spectra show characteristic regularities and indicate that the photoelectron yield excited in the presence of resonance-enhanced X-ray propagation effect can provide depth dependent information about impurity distribution and processes in thin layers.
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