In this work interdiffusion and strain relaxation in In_{0.2}Ga_{0.8}As/GaAs single quantum wells subjected to rapid thermal annealing have been studied using photoluminescence and Rutherford backscattering of 1.5 MeV He^{+} ions. It has been found that the diffusion coefficient of In atoms in GaAs, evaluated from the photoluminescence spectra for the assumed Gaussian well shapes, agrees within 30% with that obtained using Rutherford backscattering. Channeling angular scans, through the ⟨110⟩ axial direction of the heterostructures indicate that strain relaxation in the intermixed wells is exclusively due to compositional shallowing of the wells.
Photoluminescence in the neighbourhood of 1.54 μm due to the ^{4}I_{13/2}-^{4}I_{15/2} intra-4f-shell transitions of Er^{3+} ions in 6H SiC is studied. Effects of oxygen coimplantation is also investigated. No difference in the photoluminescence spectra of Er only and Er+O implanted SiC was found. It is concluded that the emission around 1.54 μm in SiC:Er originates from erbium-oxygen complexes, which are formed as a result of thermal annealing.
JavaScript is turned off in your web browser. Turn it on to take full advantage of this site, then refresh the page.