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EN
Current paper presents the results of investigating of nanostructured cathode arc vacuum evaporation coatings, based on (Ti, Hf, Nb, Si)N. Several methods of the structural and elemental analysis were used: proton microbeam, nano- and micro-electron beam, X-ray diffraction analysis. To determine tribological properties (scratch resistance, adhesive and cohesive strength) of the coatings, scratch testing were conducting. Influence of thermal annealing at temperatures 300, 500, 800, 1000C on elemental composition, microstructure, residual stress, phase composition, profiles of atomic distribution in the coatings were investigated.
EN
Using the vacuum-arc evaporation method we fabricated periodic multilayered TiN/MoN structures with different bilayer periods λ ranging from 8 to 100 nm. We found that molybdenum nitride and titanium nitride layers grown on steel show local partial epitaxy and columnar growth across interfaces. A molybdenum-titanium carbide interlayer was evidenced between the substrate and the multilayer. Molybdenum nitride and titanium nitride layers contain small (5÷30 nm) grains and are well crystallized with (100) preferred orientation. They were identified as stoichiometric fcc TiN and cubic γ-M₂N. Non-cubic molybdenum nitride phases were also detected. The hardness of the obtained structures achieved great values and maximal hardness was 31÷41.8 GPa for the multilayered structure with a 8 nm period. Hardness of the obtained coatings is 25÷45% higher in comparison with the initial single-layer nitride coatings, plasticity index of multilayered structure is 0.075.
EN
First results in the field of synthesis and research of the multicomponent (Ti-Zr-Hf-V-Nb)N nanostructured coatings are presented in the paper. Influence of processes of spinodal segregation and mass-transfer on single-layered or multilayered crystal boundary (second phase) forming were explored. Superhard nanostructured coatings were investigated before and after annealing at the temperature 600°C using unique methods (slow positron beam, proton microbeam particle induced X-ray emission-μ, Rutherford backscattering-analysis, scanning electron microscopy with energy dispersive X-ray spectroscopy, X-ray diffraction analysis was performed using DRON-4 and nanoindentor). Diffraction spectra were taken point-by-point, with a scanning step 2Θp=0.05 to 0.1°. We detected that positron trapping by defects was observed on the nanograins boundaries and interfaces (vacancies and nanopores which are the part of triple and larger grain's boundary junction). The 3D distribution maps of elements obtained by the proton microbeam (particle induced X-ray emission-μ) together with the results obtained by slow positron microbeam gave us comprehensive information about physical basis of the processes, connected with diffusion and spinodal segregation in superhard coatings.
EN
The coatings investigated in this paper were deposited via the magnetron sputtering of AlN-TiB_2-Ti-Si_2 target in Ar atmosphere. The investigation of structural-phase composition, element composition, morphology and mechanical properties before and after annealing up to 1350°C was carried out. The concentration of elements in the coating was changed after annealing at 900°C and further annealing at 1350°C (especially after annealing at 1350°C). The hardness of as-deposited coatings was 15 GPa, but after annealing at 1350°C the value of hardness increased up to 22÷23.5 GPa. The value of the viscoplastic index was 0.07. All this provide high damping properties of the coating, and amorphous-like structure makes promising the use of these coatings as diffusion barriers in the form of independent elements, and as a contacting layer in multilayer wear resistant coatings.
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EN
This work presents the results of (Zr-Ti-Cr-Nb)N superhard coatings research. The samples were fabricated by the vacuum-arc deposition method (Arc-PVD). Structure, composition and properties of these coatings were studied. The study of coatings was carried out using scanning electron microscopy, energy dispersive spectroscopy, and X-ray diffraction. Hardness measurements and adhesion tests were performed. The coatings thickness was up to 6.2 μ m, nanocrystallites sizes ranged from 4 to 7.3 nm. Values of hardness and cohesive strength were H=43.7 GPa and L_{C}=62.06 N, respectively. The optimal conditions for coating deposition were found.
EN
NbN and Nb-Si-N films were deposited by magnetron sputtering the Nb and Si targets on silicon wafers at various bias voltages, Uₛ. The deposited films were annealed to establish their thermal stability. The films were investigated by atomic force microscope, X-ray diffraction, X-ray photoelectron spectroscopy and nanoindentation. The NbN films were nanostructured, and the Nb-Si-N films had a nanocomposite structure, and represented an aggregation of δ-NbNₓ nanocrystallites embedded into the amorphous Si₃N₄ tissue (nc-δ-NbNₓ/a-Si₃N₄).
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