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  1. 1 Acta Physica Polonica A

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  1. 1 2013

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  1. 1 Abdallah B.

  2. 1 Ismail I.

  3. 1 Mrad O.

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Characterization of TiAlV Films Prepared by Vacuum Arc Deposition: Effect of Substrate Temperature

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Abdallah B., Mrad O., Ismail I.
Acta Physica Polonica A
|
2013
|
vol. 123
|
issue 1
76-79
EN
Three TiAlV films have been prepared by vacuum arc discharge technique at different substrate temperatures (50, 300, and 400°C). The depositions were carried out from aluminum, vanadium and titanium elemental targets. The temperature effects on the crystalline quality and texture have been investigated by means of X-ray diffraction. Two phases have been identified and the grain size has been found to increase with temperature. The composition of the films has been determined by proton induced X-ray emission technique. The Ti ratio was found to increase with temperature. The microhardness, measured by the Vickers indentation method was found to decrease with temperature. X-ray photoelectron spectroscopy was used to study the chemical composition of the passive layer formed on the films by analyzing high resolution spectra of Al 2p, Ti 2p and V 2p. This layer was mainly composed of TiO_2 with a small participation of other oxidation and metallic states of Ti, Al and V.
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