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EN
A correlation between the growth process and electrical properties of [Ni_{80}Fe_{20}(2 nm)/Au(2 nm)/Co(0.8 nm)/Au(2 nm)]_{15} multilayers is presented. A set of multilayers of identical composition was deposited in different temperatures. The changes in giant magnetoresistance amplitude were correlated with the changes in Co layers growth process that occur in different temperatures. The in situ conductance measurement leads to the growth mechanism identification in high temperatures as formation of Co islands. Intensified islandisation of Co was eventually confirmed by the temperature changes in shape of the Hall voltage loops, and the evolution of Co layers contribution.
EN
In this contribution the in situ conductance vs. deposition time dependences of Fe/Si multilayers are analysed. The plot of resistance multiplied by the square of the thickness as a function of iron thickness shows that during the iron deposition initially amorphous-like Fe-Si mixture is formed, next the mixture crystallises, and finally bcc-Fe phase appears. The interface mixing is also manifested by the reduction of the total multilayer thickness measured by small angle X-ray diffraction.
EN
In the following we present the role of surface scattering at Au/Co and Au/Ni-Fe interfaces in Ni-Fe/Au/Co/Au multilayers deposited in different temperatures. Specularity parameter, which describes the electron scattering, is calculated from fitting in situ collected conductance data with the Fuchs-Namba-Tesanovic model. Application of the parallel resistors model enabled to depict changes between Au/Co and Au/Ni-Fe interfaces within multilayers for each repetition. The correlation between enhanced grain boundary scattering for higher deposition temperatures and surface roughness of Ni-Fe/Au/Co/Au multilayers is found.
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In Situ Conductance of Fe/Si and Fe/Ge Multilayers

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EN
In this paper we study Fe/Si and Fe/Ge multilayers prepared at room temperature by magnetron sputtering. In situ conductance measurements reveal the formation of interfacial Fe-Si and Fe-Ge mixtures. During the Fe deposition a modification of growth mode is noticed. Deposition of Si (or Ge) onto Fe leads to the reduction of the Fe layer thickness due to interdiffusion, and Fe-Si (or Fe-Ge) structures appear. Above about 1.3 nm of deposited Si (1.5 nm of Ge) nominally pure Si (Ge) starts growing. Surface topography of the Fe/Si multilayers is studied by atomic force microscopy.
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vol. 125
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issue 4
1049-1051
EN
In this contribution we present the design and first results of a new generation of variable temperature scanning probe microscope that has been developed to enhance the performance in tunnelling spectroscopy at lower temperatures. Its performance has been proven with imaging and spectroscopy experiments on the well known Si(111), Au(111), and Ag(111) surfaces.
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