This work presents the results of (Zr-Ti-Cr-Nb)N superhard coatings research. The samples were fabricated by the vacuum-arc deposition method (Arc-PVD). Structure, composition and properties of these coatings were studied. The study of coatings was carried out using scanning electron microscopy, energy dispersive spectroscopy, and X-ray diffraction. Hardness measurements and adhesion tests were performed. The coatings thickness was up to 6.2 μ m, nanocrystallites sizes ranged from 4 to 7.3 nm. Values of hardness and cohesive strength were H=43.7 GPa and L_{C}=62.06 N, respectively. The optimal conditions for coating deposition were found.
NbN and Nb-Si-N films were deposited by magnetron sputtering the Nb and Si targets on silicon wafers at various bias voltages, Uₛ. The deposited films were annealed to establish their thermal stability. The films were investigated by atomic force microscope, X-ray diffraction, X-ray photoelectron spectroscopy and nanoindentation. The NbN films were nanostructured, and the Nb-Si-N films had a nanocomposite structure, and represented an aggregation of δ-NbNₓ nanocrystallites embedded into the amorphous Si₃N₄ tissue (nc-δ-NbNₓ/a-Si₃N₄).
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