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Microstructure Development in Multilayer TiB_x/TiSi_yC_z Coatings during Post-Deposition Heat Treatment

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Twardowska A., Rajchel B., Morgiel J., Mędala-Wójcik M.
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EN
Multilayer amorphous TiB_{x}/TiSi_{y}C_{z} coatings were formed by duplex treatment: dual beam ion beam assisted deposition and pulsed laser deposition. Post-deposition heating was applied to activate crystallization in the coating. In situ transmission electron microscopy heating experiments were conducted in the temperature range 20-600°C. Crystallization of TiB₂ phase in TiB_{x} layers begun at 450°C, while TiSi_{y}C_{z} layers retained nearly amorphous up to 600°C.
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