Within the framework of the modified semi-classical Fuchs-Sondheimer model, we investigated theoretically the electrical resistivity of multilayered structures (MLS) consisting of alternating metallic layers (of different purity and different thicknesses) in a transverse magnetic field as functions of the ratio of the adjacent layer thicknesses and the magnetic field value. We have derived both a general formula (valid at arbitrary values of layer thicknesses) and asymptotic expressions that are valid when metallic layers are thick or thin compared with the electron mean free path. We found a non-monotonic behavior in the resistivity vs. the value of an applied magnetic field. As we demonstrated, this behavior is sensitive to the characteristics of the electron scattering in the interlayer interfaces in low magnetic fields. Moreover, the MLS resistivity oscillates in high magnetic fields with the field value (or with the layer thicknesses). The oscillation includes the harmonics that correspond both to the each layer thicknesses and the total thickness. The intensity of the oscillation is determined by the diffusive electron scattering in the interfaces, and the oscillation amplitude is proportional to the coefficient of the electron transmission through the interlayer interfaces. We have calculated numerically the resistivity in a wide range of fields and layer thicknesses at various values of the parameters of the interface and bulk electron scattering.
The annealing-time dependence of the electrical conductivity of multilayered single-crystal and polycrystalline metal films has been analyzed theoretically within the frame of the semi-classical approach. It is demonstrated that changes in the electrical conductivity which are caused by the diffusion annealing allow for investigating the processes of the bulk and grain-boundary diffusion, and for estimating the coefficients of the diffusion. The electrical conductivity was calculated and the numerical analysis of the diffusion-annealing time dependence was performed at various parameters.
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