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Dye Aggregation Influence on Dye Sensitized Solar Cell Performance in Nanocoral ZnO-Based Thin Film Cells Sensitized with N-719 and Rose Bengal Dyes

100%
Borysiewicz M., Chusnutdinow S., Wzorek M., Wojciechowski T.
Acta Physica Polonica A
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2016
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vol. 130
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issue 5
1187-1189
EN
Dye sensitized solar cells were fabricated using ZnO nanostructured photoelectrodes sensitized with N-719 or Rose Bengal dyes. We assessed the device performance as a function of the sensitization time and found a dependence on time for the N-719 and no significant changes for the Rose Bengal. Furthermore, we observe that the structure of the N-719 molecule beneficial for sensitization of TiO₂ may lead to the degradation of the ZnO crystals and a growth of an amorphous shell limiting dye performance in the cells.
2
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Tuning Transparent Supercapacitor Performance by Controlling the Morphology of its ZnO Electrodes

88%
Borysiewicz M., Wzorek M., Ekielski M., Kaczmarski J., Wojciechowski T.
Acta Physica Polonica A
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2017
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vol. 131
|
issue 6
1550-1553
EN
Transparent supercapacitors were fabricated using nanostructures ZnO electrodes deposited using reactive magnetron sputtering. By fine tuning the deposition process parameters the electrodes with different morphologies were obtained, from hierarchical through sponge-like to nanocolumnar. The device performance related to the electrode morphology was assessed. It was found that the nanocolumnar electrodes provided best performance both in terms of effective device capacitance (18.3 μF/cm²) and transparency ( ≈ 100% in the visible range). The worst performance, with 80% lower effective capacitance, was obtained in the devices with the sponge-like morphology.
3
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Nanoscale Pattern Definition by Edge Oxidation of Silicon under the Si_{3}N_{4} mask - PaDEOx

76%
Zaborowski M., Grabiec P., Dobrowolski R., Panas A., Skwara K., Szmigiel D., Wzorek M.
Acta Physica Polonica A
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2009
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vol. 116
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issue S
S-139-S-141
EN
Well-controlled method of Si nanopattern definition - pattern definition by edge oxidation have been presented. The technique is suitable for fabrication of narrow paths of width ranged from several tens of nm to several μm by means of photolithography equipment working with μm-scale design rules. Process details influencing a shape of the Si pattern have been discussed. SEM examinations have been presented.
4
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Planar Optical Waveguides for Application in Optoelectronic Gas Sensors

52%
Golaszewska K., Kamińska E., Pustelny T., Struk P., Piotrowski T., Piotrowska A., Ekielski M., Kruszka R., Wzorek M., Borysiewicz M., Pasternak I., Gut K.
Acta Physica Polonica A
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2008
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vol. 114
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issue 6A
A-223-A-230
EN
In the paper, the results of technological investigations on planar optical waveguides based on high band gap oxide semiconductors were presented. Investigations concerned the technologies of depositing very thin layers of: zinc oxide ZnO, titanium dioxide TiO_2 and tin dioxide SnO_2 on substrates of quartz glass plates. There were investigated both morphological structures of the produced layers and their optical properties. The paper also presents investigations on the technology of input-output light systems in the Bragg grating structures.
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